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| Multi-generation module (MGM) system |
| Saved space |
| Highly reliable mechanism |
| Model ID | APX300 |
| Model No. | NM-EFE3AA |
| Plasma Source | ICP Plasma |
| Process Gas | 2 Lines (standard) (Maximum 6 Lines : Chlorinated Gas, Fluoride Gas, Ar, O2, He, etc.) |
| Wafer size *1 | Ø 100 mm wafer with orientation flat (standard) |
| Dimensions | W 1,350 mm x D 2,230 mm x H 2,000 mm (Does not include touch panels, operation section and signal tower) |
| Weight | 2,100 kg (differs depending on machine configuration) |
| Power Source *2 | 3-phase AC 200 / 208 / 220 / 230 / 240 ±10V, 50 / 60 Hz, 21.00kVA |
| Pneumatic Source | 0.5 MPa to 0.7 MPa, 250 L/min (A.N.R.) |
| N2 Source | 0.1 MPa to 0.2 MPa, 50 L/min (A.N.R.) |
*1 : For other size wafers, please contact us
*2 : 2 line 3-phase power source, and this shows the total
*2 : 2 line 3-phase power source, and this shows the total
